Planar Technology for NDT-Ge X-Ray Microcalorimeters: Absorber Fabrication

Date Issued
2009
Author(s)
•
Arnone, Claudio
•
•
•
Lullo, Giuseppe
•
Perinati, Emanuele
•
DOI
Abstract
We have investigated the electroplating process to deposit thick uniform films of tin on a Ge wafer coated with Spin-On Glass, in order to fabricate the absorbers for Ge microcalorimeter arrays. Here we discuss some technological details and propose two alternative metal bilayer to be used as seed for the electroplating.
Coverage
0094243X
Series
Volume
1185
Start page
112
Conferenece
THE THIRTEENTH INTERNATIONAL WORKSHOP ON LOW TEMPERATURE DETECTORS—LTD13
Conferenece place
Stanford, California
Conferenece date
20–24 July, 2009
Uri
Url
Issn Identifier
0094-243X
Ads BibCode
2009AIPC.1185..112L
Rights
open.access
File(s)
Loading...
Thumbnail Image
Name

LoCicero2009 - Planar technology for NDT-Ge X-ray microcalorimeters - absorber fabrication.pdf

Size

321.96 KB

Format

Adobe PDF

Checksum (MD5)

c6b62ee2e9d128fe14dc30daa03a078c